The role of Ga supersaturation on facet formation in the epitaxial lateral overgrowth of GaN

Abstract

In this paper, facet formation of (0001) {112¯0} {112¯2} facets during epitaxial lateral overgrowth (ELO) of GaN is investigated for different Ga vapor supersaturations. The ELO was conducted via metalorganic chemical vapor deposition on patterned GaN/sapphire templates with SiO2 masks aligned along the ⟨11¯00⟩ direction of GaN. Scanning electron microscopy was used to characterize the cross section shapes of the ELO GaN islands. A correlation of supersaturation, facet formation, and the shape of the ELO GaN islands is found. It is shown that {112¯2} facets are favored under high Ga vapor supersaturation, while {112¯0} facets are favored under low Ga vapor supersaturation. A qualitative model based on Wulff construction and density functional theory calculation is proposed to illustrate the mechanism of the facet formation of the ELO GaN islands.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 17, 2022
Source ID
10.1063/5.0077628

Entities

People

  • Ke Wang
  • Pramod Reddy
  • Ramón Collazo
  • Ronny Kirste
  • Seiji Mita
  • Shun Washiyama
  • W. J. Mecouch
  • Zlatko Sitar

Organizations

  • National Science Foundation
  • North Carolina State University
  • United States Army Research Laboratory

Tags

Fields of Study

  • Materials science

Readers

  • Materials Science and Engineering.
  • Molecular Photonics/Laser Physics
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene