Impurity-hydrogen complexes in β-Ga2O3: Hydrogenation of shallow donors vs deep acceptors

Abstract

Substitutional impurities in β-Ga2O3 are used to make the material n-type or semi-insulating. Several O–H and O–D vibrational lines for complexes that involve impurities that are shallow donors and deep acceptors have been reported recently. The present article compares and contrasts the vibrational properties of complexes that involve shallow donors (OD-Si and OD-Ge) with complexes that involve deep acceptors (OD-Fe and OD-Mg). Theoretical analysis suggests that these results arise from defect complexes based on a shifted configuration of the Ga(1) vacancy with a trapped H atom and a nearby impurity.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 20, 2022
Source ID
10.1063/5.0080341

Entities

People

  • Amanda Portoff
  • Andrew Venzie
  • E. Celeste Perez Valenzuela
  • E. R. Glaser
  • Michael Stavola
  • Stephen Pearton
  • W. Beall Fowler

Organizations

  • Defense Threat Reduction Agency
  • Division of Computer and Network Systems
  • Division of Materials Research
  • Lehigh University
  • United States Naval Research Laboratory
  • University of Florida

Tags

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Systems Analysis and Design

Technology Areas

  • Microelectronics