Reduced material loss in thin-film lithium niobate waveguides
Abstract
Thin-film lithium niobate has shown promise for scalable applications ranging from single-photon sources to high-bandwidth data communication systems. Realization of the next generation high-performance classical and quantum devices, however, requires much lower optical losses than the current state of the art resonator (Q-factor of ∼10 million). Yet the material limitations of ion-sliced thin film lithium niobate have not been explored; therefore, it is unclear how high the quality factor can be achieved in this platform. Here, using our newly developed characterization method, we find out that the material limited quality factor of thin film lithium niobate photonic platform can be improved using post-fabrication annealing and can be as high as Q ≈ 1.6 × 108 at telecommunication wavelengths, corresponding to a propagation loss of 0.2 dB/m.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Aug 01, 2022
- Source ID
- 10.1063/5.0095146
Entities
People
- Amirhassan Shams-Ansari
- Boris Desiatov
- Di Zhu
- Guanhao Huang
- Jeffrey Holzgrafe
- Lingyan He
- Marc Jankowski
- Marko Loncar
- Mian Zhang
- Mikhail Churaev
- Neil Sinclair
- Prashanta Kharel
- Rebecca Cheng
- Tobias Kippenberg
- Zihan Li
Organizations
- Air Force Office of Scientific Research
- Defense Advanced Research Projects Agency
- Harvard University
- NTT, Inc.
- Stanford University
- Swiss Federal Institute of Technology in Lausanne
- Swiss National Science Foundation