Optimization of hybridized InAsSb/InGaSb semiconductor topological materials

Abstract

Generating large topologically protected surface currents using conventional III–V infrared materials such as InAsSb/InGaSbAs quantum wells (QWs) and superlattices (SLs) has been important. In such materials, topological states can be formed at the edge by hybridizing ordinary electronic band structures. However, achieving large surface currents out of these materials is still difficult due to low emission currents and high carrier defects. In this work, we present two hybridized topological structures: one for the 6.22 Å metamorphic QWs and the other for the 6.10 Å pseudomorphic SLs. Both structures are tailored for the same hybridization gap (Δ) of ∼60 meV and optimized for the minimum crystal defects. While the QW grown on metamorphic buffers generates a significant amount of mismatch-related crystal defects, the SL grown on lattice-matched buffers produces an excellent crystalline-quality. Quasiparticle interference mapping and calculations on a SL sample show good agreement of the band structure.

Document Details

Document Type
Pub Defense Publication
Publication Date
Aug 08, 2022
Source ID
10.1063/5.0099721

Entities

People

  • Debanik Das
  • H. J. Haugan
  • J. P. Corbett
  • Jay Gupta
  • K. G. Eyink
  • K. Mahalingam
  • L. R. Ram‐Mohan
  • Robert Bedford
  • Roger K. Smith
  • Sathwik Bharadwaj

Organizations

  • Air Force Research Laboratory
  • Office Of The Under Secretary Of Defense
  • Ohio State University
  • Worcester Polytechnic Institute

Tags

Fields of Study

  • Materials science

Readers

  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene
  • Quantum Computing