Spontaneous wettability patterning via creasing instability

Abstract

Surfaces with patterned wettability contrast are important in many applications. Traditional fabrication methods rely on microfabrication technologies, which are generally not cost effective and are difficult to implement on curved surfaces. We show that wettability contrast can be patterned spontaneously on both flat and curved surfaces in a single step process by taking advantage of a reversible creasing instability. Moreover, the domain size, morphology, and wettability contrast can be controlled independently, yielding heterogeneous surfaces that show potential for generating high-throughput parallel microreactors and for harvesting water from humid air. This mechanical self-assembly approach can also lead to other functional materials beyond wettability patterning.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jul 05, 2016
Source ID
10.1073/pnas.1522700113

Entities

People

  • Dayong Chen
  • Gareth McKinley
  • Robert E. Cohen

Organizations

  • Army Research Office
  • Massachusetts Institute of Technology

Tags

Readers

  • Nanoscale Plasmonic Nanotechnology
  • Plasma Physics / Magnetohydrodynamics