Concurrent design of quasi-random photonic nanostructures
Abstract
Quasi-random nanostructures with neither periodic nor fully disordered geometries have been used for photovoltaics and light-emitting diodes because the stochastic patterns can manipulate light over a broad range of wavelengths and over wide collection angles. Although serial processes such as electron-beam lithography can fabricate nanostructures, prototype manufacturing over large areas is not possible. Moreover, trial-and-error processing optimization cannot guarantee the fabrication feasibility of the designed structures. In this paper, we report wrinkle lithography, a wafer-scale fabrication procedure whose processing steps can be integrated with concurrent design of nanostructures and function. As a proof-of-concept demonstration, we rapidly optimized three-dimensional structures for light trapping in amorphous silicon and realized >160% enhancement in light absorption over the 800–1,200-nm wavelength range.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jul 31, 2017
- Source ID
- 10.1073/pnas.1704711114
Entities
People
- Clifford J. Engel
- Dongjoon Rhee
- Shuangcheng Yu
- Teri W. Odom
- Thaddeus Reese
- Wei Chen
- Won-Kyu Lee
Organizations
- National Science Foundation
- Northwestern University
- Office of Naval Research