In situ low temperature As-doping of Ge films using As(SiH3)3 and As(GeH3)3: fundamental properties and device prototypes

Document Details

Document Type
Pub Defense Publication
Publication Date
Sep 14, 2015
Source ID
10.1088/0268-1242/30/10/105028

Entities

People

  • C. L. Senaratne
  • Chi Xu
  • J. D. Gallagher
  • J. Kouvetakis
  • J. Menéndez
  • P. M. Wallace
  • P. Sims

Organizations

  • Air Force Office of Scientific Research
  • Division of Materials Research