Characterization of fast interface states in nitrogen- and phosphorus-treated 4H-SiC MOS capacitors

Document Details

Document Type
Pub Defense Publication
Publication Date
Jun 16, 2015
Source ID
10.1088/0268-1242/30/7/075011

Entities

People

  • C. Jiao
  • D K Schroder
  • J. A. Cooper
  • M. Goryll
  • Matthew Marinella
  • Robert Kaplar
  • Shilpa S. Dhar
  • W C Kao

Organizations

  • National Science Foundation
  • United States Army Research Laboratory