The effect of reactive ion etch (RIE) process conditions on ReRAM device performance

Document Details

Document Type
Pub Defense Publication
Publication Date
Aug 24, 2017
Source ID
10.1088/1361-6641/aa7eed

Entities

People

  • J Van Nostrand
  • J. Holt
  • K. Beckmann
  • N C Cady
  • W Olin-ammentorp
  • Z Alamgir

Organizations

  • Air Force Research Laboratory