HfO2 as gate insulator on N-polar GaN-AlGaN heterostructures
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Feb 01, 2021
- Source ID
- 10.1088/1361-6641/abe21c
Entities
People
- Athith Krishna
- Christopher Clymore
- Elaheh Ahmadi
- S. Keller
- Subhajit Mohanty
- Zhe Jian
Organizations
- Office of Naval Research