Giant enhancement of the in-plane critical field for thin Al films via proximity coupling to a topological insulator

Document Details

Document Type
Pub Defense Publication
Publication Date
Oct 20, 2020
Source ID
10.1103/physrevb.102.144518

Entities

People

  • Gang Shi
  • Haoyun Deng
  • N. E. Bonesteel
  • Pedro Schlottmann
  • Peng Xiong
  • Tianhan Liu
  • Yongqing Li
  • Zhilin Li
  • Zhu Lin

Organizations

  • Chinese Academy of Sciences
  • Defense Advanced Research Projects Agency
  • National Natural Science Foundation of China
  • National Science Foundation
  • Program 973

Tags

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene