Evidence of the Topological Hall Effect in Pt/Antiferromagnetic Insulator Bilayers

Document Details

Document Type
Pub Defense Publication
Publication Date
Dec 05, 2019
Source ID
10.1103/physrevlett.123.237206

Entities

People

  • Fengyuan Yang
  • Jinwoo Hwang
  • Menglin Zhu
  • Sisheng Yu
  • Yang Cheng

Organizations

  • Defense Advanced Research Projects Agency
  • United States Department of Energy

Tags

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene