Atomistic study of the electronic contact resistivity between the half-Heusler alloys (HfCoSb, HfZrCoSb, HfZrNiSn) and the metal Ag

Document Details

Document Type
Pub Defense Publication
Publication Date
Jun 08, 2018
Source ID
10.1103/physrevmaterials.2.065401

Entities

People

  • Catalin D. Spataru
  • François Léonard
  • Yuping He

Organizations

  • Defense Advanced Research Projects Agency
  • United States Department of Defense
  • United States Department of Energy

Tags

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene