CMOS Demonstration of Negative Capacitance HfO2-ZrO2 Superlattice Gate Stack in a Self-Aligned, Replacement Gate Process

Document Details

Document Type
Pub Defense Publication
Publication Date
Dec 03, 2022
Source ID
10.1109/iedm45625.2022.10019472

Entities

People

  • Chun-Hui Chen
  • D. Pipitone
  • F. Bauer
  • G. Pinelli
  • James Hunt
  • M. Cook
  • M. Mohamed
  • Mathew Smith
  • N. Shanker
  • R. Rastogi
  • S. Meninger
  • S. Salahuddin
  • S.s. Cheema
  • Wen Li

Organizations

  • Massachusetts Institute of Technology
  • United States Air Force