Impact of Atomic Layer Deposition Co-Reactant Pulse Time on 65nm CMOS Integrated Hafnium Dioxide-based Nanoscale RRAM Devices

Document Details

Document Type
Pub Defense Publication
Publication Date
Oct 01, 2020
Source ID
10.1109/iirw49815.2020.9312877

Entities

People

  • Jubin Hazra
  • Karsten Beckmann
  • Maximilian Liehr
  • Nathaniel C Cady
  • Sarah Rafiq

Organizations

  • Air Force Research Laboratory