High-Speed Ultrasmooth Etching of Fused Silica Substrates in SF6, NF3, and H2O-Based Inductively Coupled Plasma Process

Document Details

Document Type
Pub Defense Publication
Publication Date
Aug 01, 2015
Source ID
10.1109/jmems.2014.2359292

Entities

People

  • Chenchen Zhang
  • Gokhan Hatipoglu
  • Srinivas Tadigadapa

Organizations

  • Defense Advanced Research Projects Agency
  • National Science Foundation