Ultra Deep Reactive Ion Etching of High Aspect-Ratio and Thick Silicon Using a Ramped-Parameter Process

Document Details

Document Type
Pub Defense Publication
Publication Date
Aug 01, 2018
Source ID
10.1109/jmems.2018.2843722

Entities

People

  • A Sandoughsaz
  • Kevin J. Owen
  • Khalil Najafi
  • Yemin Tang

Organizations

  • United States Army Research Laboratory