Charge Trapping in Al2O3/$\beta$ -Ga2O3-Based MOS Capacitors

Document Details

Document Type
Pub Defense Publication
Publication Date
Jul 01, 2018
Source ID
10.1109/led.2018.2841899

Entities

People

  • Daniel M. Fleetwood
  • En Xia Zhang
  • Hong Zhou
  • Maruf Bhuiyan
  • Peide Ye
  • Rong Jiang
  • T. P.

Organizations

  • Defense Threat Reduction Agency