Improvement by Channel Recess of Contact Resistance and Gate Control in Large-Scale Spin-Coated MoS2 MOSFETs

Document Details

Document Type
Pub Defense Publication
Publication Date
Sep 01, 2018
Source ID
10.1109/led.2018.2854789

Entities

People

  • Alexander Göritz
  • Asher Madjar
  • James C. M. Hwang
  • Kuanchen Xiong
  • Lei Li
  • Matthias Wietstruck
  • Mehmet Kaynak
  • Nicholas C. Strandwitz
  • Roderick J. Marstell
  • Xiangfeng Duan
  • Yu Huang
  • Zhaoyang Lin

Organizations

  • Air Force Office of Scientific Research
  • National Science Foundation
  • Office of Naval Research