Foundry Integration of Carbon Nanotube FETs With 320 nm Contacted Gate Pitch Using New Lift-Off-Free Process

Document Details

Document Type
Pub Defense Publication
Publication Date
Mar 01, 2022
Source ID
10.1109/led.2022.3144936

Entities

People

  • Andrew Yu
  • Brian Benton
  • Christian Lau
  • Mark Nelson
  • Max M Shulaker
  • Tathagata Srimani

Organizations

  • Analog Devices
  • Defense Advanced Research Projects Agency
  • Massachusetts Institute of Technology
  • Samsung Group