High-Efficiency Grating Couplers Near 1310 nm Fabricated by 248-nm DUV Lithography

Document Details

Document Type
Pub Defense Publication
Publication Date
Aug 01, 2014
Source ID
10.1109/lpt.2014.2329326

Entities

People

  • Andy Eu-jin Lim
  • Ari Novack
  • Guo-qiang Lo
  • Hang Guan
  • Matthew Streshinsky
  • Michael E. Hochberg
  • Ruizhi Shi
  • Tom Baehr-jones

Organizations

  • National University of Singapore