Effect of Gate Insulator Thickness on RF Power Gain Degradation of Vertically Scaled GaN MIS-HEMTs at 40 GHz

Document Details

Document Type
Pub Defense Publication
Publication Date
Dec 01, 2015
Source ID
10.1109/tdmr.2015.2467161

Entities

People

  • Brian P. Downey
  • D. Scott Katzer
  • David J. Meyer
  • Jason A. Roussos
  • Mario G. Ancona
  • Ming Pan
  • Xiang Gao

Organizations

  • Office of Naval Research

Tags

Technology Areas

  • Microelectronics