Analyzing the Effect of High-k Dielectric-Mediated Doping on Contact Resistance in Top-Gated Monolayer MoS2 Transistors

Document Details

Document Type
Pub Defense Publication
Publication Date
Oct 01, 2018
Source ID
10.1109/ted.2018.2866772

Entities

People

  • Abdullah Alharbi
  • Davood Shahrjerdi

Organizations

  • Army Research Office
  • Brookhaven National Laboratory
  • National Science Foundation