Breakdown Voltage Enhancement in ScAlN/GaN High-Electron-Mobility Transistors by High-k Bismuth Zinc Niobate Oxide

Document Details

Document Type
Pub Defense Publication
Publication Date
Jul 01, 2021
Source ID
10.1109/ted.2021.3084136

Entities

People

  • Andy Xie
  • Caiyu Wang
  • Cathy Lee
  • Edward Beam
  • Hao Xue
  • Hao Yang
  • Junao Cheng
  • Mohammad Wahidur Rahman
  • Shahadat H. Sohel
  • Siddharth Rajan
  • Wu Lu
  • Yu Cao

Tags

Technology Areas

  • Microelectronics