Total Ionizing Dose (TID) Effects in Ultra-Thin Body Ge-on-Insulator (GOI) Junctionless CMOSFETs With Recessed Source/Drain and Channel

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 01, 2017
Source ID
10.1109/tns.2016.2624294

Entities

People

  • Daniel M. Fleetwood
  • En Xia Zhang
  • Heng Wu
  • Kai Ni
  • Maruf Bhuiyan
  • Peide Ye
  • Robert A. Reed
  • Rong Jiang
  • Shufeng Ren
  • T. P. Ma

Organizations

  • Defense Threat Reduction Agency
  • National Science Foundation

Tags

Technology Areas

  • Microelectronics