Analysis of TID Process, Geometry, and Bias Condition Dependence in 14-nm FinFETs and Implications for RF and SRAM Performance

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 01, 2017
Source ID
10.1109/tns.2016.2634538

Entities

People

  • A. I. Silva
  • B. L. Draper
  • Dennis R. Ball
  • En Xia Zhang
  • J. A. Felix
  • J. S. Kauppila
  • K. J. Shetler
  • L. W. Massengill
  • M. Eller
  • M. L. Alles
  • M. P. King
  • M. R. Shaneyfelt
  • S. Samavedam
  • T. D. Haeffner
  • T. L. Meisenheimer
  • W. C. Rice
  • Xinghua Wu

Organizations

  • Defense Threat Reduction Agency
  • Vanderbilt University