Defects and Low-Frequency Noise in Irradiated Black Phosphorus MOSFETs With HfO2 Gate Dielectrics

Document Details

Document Type
Pub Defense Publication
Publication Date
Jun 01, 2018
Source ID
10.1109/tns.2018.2828080

Entities

People

  • Andrew O'Hara
  • Chundong Liang
  • Daniel M. Fleetwood
  • En Xia Zhang
  • M. L. Alles
  • Pan Wang
  • Ronald D. Schrimpf
  • Rui Ma
  • Simeng Zhao
  • Sokrates T. Pantelides
  • Steven J Koester
  • Yifan Su

Organizations

  • Defense Threat Reduction Agency
  • National Science Foundation