Total-Ionizing-Dose Effects and Low-Frequency Noise in N-Type Carbon Nanotube Field-Effect Transistors With HfO₂ Gate Dielectrics

Document Details

Document Type
Pub Defense Publication
Publication Date
Apr 01, 2023
Source ID
10.1109/tns.2023.3242644

Entities

People

  • Andrew M. Aaron
  • Bharat Bhuva
  • Daniel M. Fleetwood
  • En Xia Zhang
  • J. L. Davidson
  • J. S. Kauppila
  • L. W. Massengill
  • Michael L. Alles
  • Patrick K. Darmawi-Iskandar

Organizations

  • Defense Advanced Research Projects Agency
  • Vanderbilt University