Hot Electrons as the Dominant Source of Degradation for Sub-5nm HZO FeFETs
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jun 01, 2020
- Source ID
- 10.1109/vlsitechnology18217.2020.9265067
Entities
People
- Ava J. Tan
- Chenming Hu
- Jong-Ho Bae
- Li-Chen Wang
- Luca Larcher
- Milan Pešić
- Sayeef Salahuddin
- Yu-Hung Liao