The Conversion of Perhydropolysilazane into SiON Films Characterized by X‐Ray Photoelectron Spectroscopy
Abstract
Silicon oxynitride (SiON) films of ~1 μm thickness were made by dip coating and subsequent thermal treatment of a preceramic polymer: perhydropolysilazane (PHPS). X‐ray photoelectron spectroscopy was used to analyze the surface of a series of SiON films annealed in air between room temperature and 800°C. Results reveal that the progressive changes in the bonding states of silicon, oxygen, and nitrogen due to different degrees of annealing lead to a systematic evolution of atomic ratios of the films. It is shown that PHPS forms a unique amorphous SiOxNy material upon annealing in air up to 800°C with evolving compositions, instead of a mixture of Si3N4 and SiO2.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Nov 05, 2012
- Source ID
- 10.1111/jace.12045
Entities
People
- Fumio S. Ohuchi
- Kaishi Wang
- Rajendra K. Bordia
- Xiaohao Zheng
Organizations
- Air Force Office of Scientific Research
- University of Washington