Modification of the Schottky barrier height at the RuO2 cathode during resistance degradation of Fe‐doped SrTiO3

Abstract

The long‐term stability of electronic devices at high temperatures and electric fields might be strongly influenced by the electronic properties of interfaces. A modification of Schottky barrier heights at electrode interfaces of functional oxides upon changes of the external oxygen partial pressure is well documented in literature. In this work, an experimental approach using X‐ray photoelectron spectroscopy is presented, which enables to study transient changes in the Schottky barrier height induced by electrical degradation. A rise of the Fermi level at the RuO2 cathode interface of Fe‐doped SrTiO3 single crystals by 0.6 eV is observed in the course of resistance degradation. The change of the effective barrier height is associated to the migration of oxygen vacancies towards the cathode and accompanied by the observed reduction of Ti. Different scenarios are discussed to explain the origin of barrier modification and the localization of the reduced Ti.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jun 15, 2017
Source ID
10.1111/jace.14962

Entities

People

  • Andreas Klein
  • Clive A. Randall
  • Ramis Hertwig
  • Ruth Giesecke
  • Thorsten J M Bayer

Organizations

  • Air Force Materiel Command
  • Air Force Office of Scientific Research
  • Pennsylvania State University
  • Technical University of Darmstadt
  • United States Air Force

Tags

Fields of Study

  • Materials science

Readers

  • Plasma Physics.
  • Quantum Chemistry

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene