Chemical equilibrium analysis of silicon carbide oxidation in oxygen and air

Abstract

Due to their refractory nature and oxidation resistance, Ultra‐High Temperature Ceramic materials, including silicon carbide, are of interest in hypersonic aerospace applications. To analyze the thermodynamic behavior of silicon carbide during transition between passive and active oxidation states, chemical equilibrium calculations are performed. The predicted oxygen pressures for passive‐to‐active transition show improved agreement up to an order of magnitude with experimental transition data in the literature, compared with Wagner's model. Both oxygen and air environments are examined, and a 3% difference in transition temperature is observed. Material response analysis demonstrates that a surface temperature jump occurs during thermal oxidation of silicon carbide, corresponding to passive‐to‐active transition.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 16, 2019
Source ID
10.1111/jace.16272

Entities

People

  • Iain D. Boyd
  • Samuel Chen

Organizations

  • Office of Naval Research
  • University of Michigan

Tags

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.
  • Thin Film Deposition Science.

Technology Areas

  • Hypersonics
  • Hypersonics - Hypersonic Flight
  • Space