Three-Dimensional Compatible Sacrificial Nanoimprint Lithography for Tuning the Wettability of Thermoplastic Materials
Abstract
We report the tuning of surface wetting through sacrificial nanoimprint lithography (SNIL). In this process, grown ZnO nanomaterials are transferred by imprint into a metallic glass (MG) and an elastomeric material, and then etched to impart controlled surface roughness. This process increases the hydrophilicity and hydrophobicity of both surfaces, the Pt57.5Cu14.7Ni5.3P22.5 MG and thermoplastic elastomer (TPE), respectively. The growth conditions of the ZnO change the characteristic length scale of the roughness, which in turn alters the properties of the patterned surface. The novelty of this approach includes reusability of templates and that it is able to create superhydrophilic and superhydrophobic surfaces in a manner compatible with the fabrication of macroscopic three-dimensional (3D) parts. Because the wettability is achieved by only modifying topography, without using any chemical surface modifiers, the prepared surfaces are relatively more durable.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Oct 16, 2018
- Source ID
- 10.1115/1.4041532
Entities
People
- Aaron Anesgart
- Chinedum Osuji
- Chloe Cho
- Imrhankhan Shajahan
- Jan Schroers
- Jittisa Ketkaew
- Jonathan P Singer
- Manesh Gopinadhan
- Michael Higgins
- Molla Hasan
- Saira Reyes
- Saransh Chopra
Organizations
- Division of Materials Research
- Office of Naval Research
- Rutgers University
- Yale University