Imprinted large-scale high density polymer nanopillars for organic solar cells

Abstract

Nanoimprint with a large-scale nanoporous Si mold is developed to fabricate high density periodic nanopillars (∼1010∕cm2) in various functional polymers. A anodic alumina membrane is first obtained using electrochemical anodization. The membrane is used as a mask for a two-step plasma etching process to obtain a Si mold of 50–80nm wide and 100–900nm deep pores. The mold is used in nanoimprint lithography to fabricate ordered and high density polymer nanopillars and nanopores in SU-8, hydrogen silsesquixane, polymethylmethacrylate, poly(3-hexylthiophane) (P3HT), and phenyl-C61-butyric acid methyl ester (PCBM). Then, the imprinted P3HT nanopillars were used to make bulk heterojunction solar cells by depositing PCBM on top of the pillars. Imprinting provides a way to precisely control the interdigitized heterojunction morphology, leading to improved solar cell performance.

Document Details

Document Type
Pub Defense Publication
Publication Date
Nov 01, 2008
Source ID
10.1116/1.2981076

Entities

People

  • Anvar A. Zakhidov
  • Fatih Buyukserin
  • Jinming Gao
  • Kamil Mielczarek
  • Mukti Aryal
  • Wenchuang (walter) Hu
  • Xiao-mei Zhao

Organizations

  • Air Force Office of Scientific Research
  • University of Texas at Dallas

Tags

Fields of Study

  • Materials science

Readers

  • Nanocomposite Materials Science
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene