Large area three dimensional structure fabrication using multilayer electron beam lithography
Abstract
Three dimensional nanostructures are of great interest in photonics and optical sensor communities. Although there are many theoretical models developed, lithographic reduction to practice is an ongoing challenge. Numerous lithographic techniques have been proposed for fabricating three dimensional structures with applications in photonics. We demonstrate a novel three-dimensional electron beam fabrication method that is precise, fast, intrinsically self-aligned and has the ability to produce large area patterns.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Nov 01, 2016
- Source ID
- 10.1116/1.4966961
Entities
People
- John G. Hartley
- Ravi K. Bonam
Organizations
- SUNY Polytechnic Institute