Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry
Abstract
A new imaging technique enables nondestructive, 3D characterization of nanostructures, their composition, and interfaces.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 29, 2021
- Source ID
- 10.1126/sciadv.abd9667
Entities
People
- Bin Wang
- Brendan McBennett
- Charles S. Bevis
- Chen-Ting Liao
- Christina L Porter
- Daniel E Adams
- David Ren
- Galen P. Miley
- Henry Kapteyn
- Jianwei Miao
- Jihan Zhou
- Joshua L. Knobloch
- Laura Waller
- Margaret M. Murnane
- Matthew N. Jacobs
- Michael Gerrity
- Michael Tanksalvala
- Naoto Horiguchi
- Nicholas W. Jenkins
- Peter Johnsen
- Robert M Karl
- Sadegh Yazdi
- Seth L. Cousin
- Yuka Esashi
- Zhe Zhang
Organizations
- Gordon and Betty Moore Foundation
- Interuniversity Microelectronics Centre
- National Science Foundation Office of the Director
- Northwestern University
- University of California, Los Angeles
- University of Colorado