Review—Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High-kDielectrics: Beryllium Oxide, Aluminum Oxide, Hafnium Oxide, and Aluminum Nitride

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 01, 2017
Source ID
10.1149/2.0091710jss

Entities

People

  • Anthony N. Caruso
  • Antonio M. Rudolph
  • Bradley J. Nordell
  • David C. Johnson
  • Devin R. Merrill
  • Donghyi Koh
  • Erik Hadland
  • John T. Gaskins
  • Jung Hwan Yum
  • Li Han
  • Liyi Li
  • Liza Ross
  • Marc French
  • Michelle M. Paquette
  • Patrick E Hopkins
  • Patrick Henry
  • Sage R Bauers
  • Sanjay Banerjee
  • Sean W. King
  • W. A. Lanford

Organizations

  • Army Research Office
  • National Science Foundation