Effect of Annealing on the Band Alignment of ALD SiO2 on (AlxGa1-x)2O3 for x = 0.2 - 0.65

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 01, 2019
Source ID
10.1149/2.0251911jss

Entities

People

  • Aman Haque
  • Chaker Fares
  • Fan Ren
  • Holger von Wenckstern
  • Marius Grundmann
  • Marko J. Tadjer
  • Max Kneiß
  • Stephen Pearton
  • Zahabul Islam

Organizations

  • Defense Threat Reduction Agency
  • Division of Materials Research
  • European Social Fund Plus
  • Office of Naval Research