Two-dimensional extreme skin depth engineering for CMOS photonics
Abstract
Extreme skin depth engineering (e-skid) can be applied to integrated photonics to manipulate the evanescent field of a waveguide. Here we demonstrate thate-skidcan be implemented in two directions in order to deterministically engineer the evanescent wave allowing for dense integration with enhanced functionalities. In particular, by increasing the skin depth, we enable the creation of two-dimensional (2D)e-skiddirectional couplers with large gaps and operational bandwidth. Here we experimentally validate 2De-skidfor integrated photonics in a complementary metal–oxide semiconductor (CMOS) photonics foundry and demonstrate strong coupling with a gap of 1.44 µm.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Mar 24, 2021
- Source ID
- 10.1364/josab.416848
Entities
People
- Christopher C. Tison
- Daniel Coleman
- Gerald Leake
- Gregory A. Howland
- Justin Bickford
- Matthew van Niekerk
- Michael L. Fanto
- Pak Cho
- Saman Jahani
- Stefan F. Preble
- Stephen Anderson
- Zubin Jacob
Organizations
- Air Force Research Laboratory
- California Institute of Technology
- National Science Foundation
- Purdue University
- Rensselaer Polytechnic Institute
- Rochester Institute of Technology
- State University of New York
- United States Army Research Laboratory