Thermo-optic properties of silicon-rich silicon nitride for on-chip applications

Abstract

We demonstrate the thermo-optic properties of silicon-rich silicon nitride (SRN) films deposited using plasma-enhanced chemical vapor deposition (PECVD). Shifts in the spectral response of Mach-Zehnder interferometers (MZIs) as a function of temperature were used to characterize the thermo-optic coefficients of silicon nitride films with varying silicon contents. A clear relation is demonstrated between the silicon content and the exhibited thermo-optic coefficient in silicon nitride films, with the highest achievable coefficient being as high as (1.65±0.08) ×10−4 K-1. Furthermore, we realize an SRN multi-mode interferometer (MMI) based thermo-optic switch with over 20 dB extinction ratio and total power consumption for two-port switching of 50 mW.

Document Details

Document Type
Pub Defense Publication
Publication Date
Aug 10, 2020
Source ID
10.1364/oe.396969

Entities

People

  • A. Friedman
  • Hani Nejadriahi
  • Paul K. L. Yu
  • Rajat Sharma
  • Steve Pappert
  • Yeshaiahu Fainman

Organizations

  • National Science Foundation
  • Office of Naval Research
  • Office of Science

Tags

Readers

  • Integrated Circuit Design and Technology.
  • Parasitology and Pharmacology of Malaria.
  • Thin Film Deposition Science.