Photonic topology optimization with semiconductor-foundry design-rule constraints
Abstract
We present a unified density-based topology-optimization framework that yields integrated photonic designs optimized for manufacturing constraints including all those of commercial semiconductor foundries. We introduce a new method to impose minimum-area and minimum-enclosed-area constraints, and simultaneously adapt previous techniques for minimum linewidth, linespacing, and curvature, all of which are implemented without any additional re-parameterizations. Furthermore, we show how differentiable morphological transforms can be used to produce devices that are robust to over/under-etching while also satisfying manufacturing constraints. We demonstrate our methodology by designing three broadband silicon-photonics devices for nine different foundry-constraint combinations.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jul 13, 2021
- Source ID
- 10.1364/oe.431188
Entities
People
- Alec M. Hammond
- Ardavan Oskooi
- Stephen E. Ralph
- Steven G. Johnson
Organizations
- Army Research Office
- Georgia Tech
- Massachusetts Institute of Technology