Exploring microstructural variations in highly transparent AlN/SiO2 nano multilayers

Abstract

The microstructure of optically optimized transparent AlN/SiO2 nano multilayers were investigated and compared with baseline repeated bilayer configurations. The multilayered films were synthesized by magnetron sputtering and characterized by transmission electron microscopy and spectrophotometry with multifunctional behavior evaluated by nanoindentation and residual stress analysis. The optically optimized AlN/SiO2 multilayers exhibit higher transmittance (%T300-800nm≈95%), distinct crystalline/amorphous interfaces, and changes in the grain morphology as compared to the periodic baseline samples (%T300-800nm≈70-80%). Varying both layer thickness and layer ratio to maximize transparency showed a significant impact on microstructure and interface character.

Document Details

Document Type
Pub Defense Publication
Publication Date
Mar 02, 2020
Source ID
10.1364/ome.389156

Entities

People

  • Andrea M. Hodge
  • Chelsea D. Appleget

Organizations

  • National Aeronautics and Space Administration
  • Office of Naval Research

Tags

Fields of Study

  • Materials science

Readers

  • Nanofabrication and Microfabrication.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene