Ultra-thin plasmonic detectors
Abstract
Plasmonic materials, and their ability to enable strong concentration of optical fields, have offered a tantalizing foundation for the demonstration of sub-diffraction-limit photonic devices. However, practical and scalable plasmonic optoelectronics for real world applications remain elusive. In this work, we present an infrared photodetector leveraging a device architecture consisting of a “designer” epitaxial plasmonic metal integrated with a quantum-engineered detector structure, all in a mature III-V semiconductor material system. Incident light is coupled into surface plasmon-polariton modes at the detector/designer metal interface, and the strong confinement of these modes allows for a sub-diffractive ( ∼ λ 0 / 33 ) detector absorber layer thickness, effectively decoupling the detector’s absorption efficiency and dark current. We demonstrate high-performance detectors operating at non-cryogenic temperatures ( T = 195 K ), without sacrificing external quantum efficiency, and superior to well-established and commercially available detectors. This work provides a practical and scalable plasmonic optoelectronic device architecture with real world mid-infrared applications.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Dec 08, 2021
- Source ID
- 10.1364/optica.438039
Entities
People
- Aaron J. Muhowski
- Abhilasha Kamboj
- Daniel Wasserman
- Leland Nordin
- Priyanka Petluru
Organizations
- Defense Advanced Research Projects Agency
- Division of Electrical, Communications & Cyber Systems
- Division of Materials Research
- Lockheed Martin
- National Science Foundation
- University of Texas at Austin