Phase-shifted Bragg gratings in a foundry silicon nitride platform
Abstract
Bragg gratings are key optical elements for applications in communications, sensing, and lasers. Phase-shifted Bragg gratings are a special case where the simple periodic structure is altered to allow a narrow spectral passband within the optical bandgap. Here, we demonstrate phase-shifted silicon nitride gratings fabricated using 193 nm deep ultraviolet lithography (DUV) on the AIM Photonics 300 mm silicon photonics foundry line. We measure the grating properties and verify the results with a transfer-matrix method (TMM) model. The standard grating expressions for extracting the coupling coefficient κ and bandwidth do not apply and are updated to account for the phase shift. These results inform future designs for on-chip grating filters and distributed feedback (DFB) lasers.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Mar 03, 2021
- Source ID
- 10.1364/osac.413672
Entities
People
- Andrew Ducharme
- Chad Husko
- Jeffrey R Guest
- Nicholas M. Fahrenkopf
Organizations
- Argonne National Laboratory
- Loyola University Chicago
- State University of New York
- United States Department of Defense
- United States Department of Energy