Gate-tunable metafilm absorber based on indium silicon oxide

Abstract

In this work, reconfigurable metafilm absorbers based on indium silicon oxide (ISO) were investigated. The metafilm absorbers consist of nanoscale metallic resonator arrays on metal-insulator-metal (MIM) multilayer structures. The ISO was used as an active tunable layer embedded in the MIM cavities. The tunable metafilm absorbers with ISO were then fabricated and characterized. A maximum change in the reflectance of 57% and up to 620 nm shift in the resonance wavelength were measured.

Document Details

Document Type
Pub Defense Publication
Publication Date
Sep 20, 2019
Source ID
10.1515/nanoph-2019-0190

Entities

People

  • Hamid T Chorsi
  • Hongwei Zhao
  • Jon A Schuller
  • Jonathan Klamkin
  • Luca Dal Negro
  • Prasad P. Iyer
  • Ran Zhang
  • Wesley A. Britton
  • Yuyao Chen

Organizations

  • Boston University
  • National Science Foundation
  • United States Air Force
  • University of California

Tags

Readers

  • Materials Science (Mechanical Engineering).
  • Nanoscale Plasmonic Nanotechnology
  • Optical Physics and Photonics.

Technology Areas

  • Microelectronics