Band alignment of atomic layer deposited SiO2and HfSiO4with $(\bar{2}01)$ β-Ga2O3

Document Details

Document Type
Pub Defense Publication
Publication Date
Jun 14, 2017
Source ID
10.7567/jjap.56.071101

Entities

People

  • Akito Kuramata
  • Brent P. Gila
  • David C. Hays
  • Fan Ren
  • Patrick H. Carey Iv
  • Soohwan Jang
  • Stephen Pearton

Organizations

  • Defense Threat Reduction Agency
  • National Research Foundation of Korea
  • New Energy and Industrial Technology Development Organization