Maskless Direct-Write Nanolithography for Defense Applications
Abstract
(U)The Maskless Direct-Write Nanolithography for Defense Applications program will develop a maskless, direct-write lithography tool that will address both the DoD’s need for affordable, high performance, low volume Integrated Circuits (ICs) and the commercial market’s need for highly customized, application-specific ICs. In addition, this program will provide a cost effective manufacturing technology for low volume nanoelectromechanical systems (NEMS) and nanophotonics initiatives within the DoD. Transition will be achieved by maskless lithography tools, installed in the Trusted Foundry and in commercial foundries, which will enable incorporation of state-of-the-art semiconductor devices in new military systems, and allow for the cost-effective upgrade of legacy military systems.
Document Details
- Document Type
- Accomplishment
- Publication Date
- Oct 01, 2011
- Source ID
- 3519f7edc3fe7a917c5dab2338b548d6