RESOLVE
Abstract
The goal of RESOLVE is to extend the capability of the Maskless Nanowriter program by developing an e-beam direct-write lithography tool capable of affordable fabrication of custom ASICS down to nodes required by the DoD in the Trusted Foundry. In addition, this program will provide a manufacturing technology for nanoelectromechanical systems (NEMS) and nanophotonics initiatives within the DoD. It is expected that this tool will provide a cost-effective alternative to extreme ultra-violet lithography for fabrication of deep-sub-micron complementary metal-oxide semiconductor (CMOS) processes and is projected to also meet the objectives required in the commercial sector for high-volume manufacturing.
Document Details
- Document Type
- Accomplishment
- Publication Date
- Oct 01, 2014
- Source ID
- 5d665cab5f3eab66f1195aabace8877f