Trusted Mask Trust Approach
Abstract
This project staffs and supports operation of a new secure (SECRET-level) photomask manufacturing capability at an existing SOTA commercial photomask manufacturing supplier to secure the masks and design IP of acquisition programs when using commercial microelectronic fabrication facilities other than the Trusted Foundry. This capability can be used in conjunction with one or more leading-edge commercial foundries. This capability will address trusted masks at technology node sizes less than 130 nanometers (nm) down to 14nm.
Document Details
- Document Type
- Project
- Publication Date
- Oct 01, 2019
- Source ID
- 812_0605294D8Z_5_0400_PB_2019
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