Trusted Mask Trust Approach

Abstract

This project staffs and supports operation of a new secure (SECRET-level) photomask manufacturing capability at an existing SOTA commercial photomask manufacturing supplier to secure the masks and design intellectual property (IP) of acquisition programs when using commercial microelectronic fabrication facilities other than the Trusted Foundry. This capability can be used in conjunction with one or more leading-edge commercial foundries. This capability will address trusted masks at technology node sizes less than 130 nanometers (nm) down to 14nm.

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Document Details

Document Type
Project
Publication Date
Oct 01, 2020
Source ID
812_0605294D8Z_5_0400_PB_2020

Tags

Fields of Study

  • Physics

Readers

  • Cybersecurity.
  • Integrated Circuit Design and Technology.

Technology Areas

  • Microelectronics

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